摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask aligner by which alignment between a mask and a wafer can be performed easily and accurately. <P>SOLUTION: The present invention relates to a mask aligner 1 exposing a wafer W having a predetermined size through a mask M. The mask aligner 1 includes: an exposure stage 3f on which the wafer W is placed; a mask holder 3b which is mounted so as to face a surface of the exposure stage 3f, the surface being on a side where the wafer W is placed, and on which the mask M is placed so as to face the wafer W placed on the exposure stage 3f; and an LED light source 8c mounted so as to face the exposure stage 3f via the mask holder 3b. <P>COPYRIGHT: (C)2013,JPO&INPIT |