发明名称 EXPOSURE SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask aligner by which alignment between a mask and a wafer can be performed easily and accurately. <P>SOLUTION: The present invention relates to a mask aligner 1 exposing a wafer W having a predetermined size through a mask M. The mask aligner 1 includes: an exposure stage 3f on which the wafer W is placed; a mask holder 3b which is mounted so as to face a surface of the exposure stage 3f, the surface being on a side where the wafer W is placed, and on which the mask M is placed so as to face the wafer W placed on the exposure stage 3f; and an LED light source 8c mounted so as to face the exposure stage 3f via the mask holder 3b. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013120789(A) 申请公布日期 2013.06.17
申请号 JP20110267033 申请日期 2011.12.06
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;SANMEI CO INC;NANOMETRIC TECHNOLOGY INC 发明人 HARA SHIRO;KUMPUAN SOMAWANG;INUZUKA YOSHIKI;YOKOYAMA YASUAKI
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
代理机构 代理人
主权项
地址