| 摘要 |
PURPOSE: A sputtering magnetron is provided to control plasma racetracks created at both ends of a cylindrical target by rotating a rotary magnet unit and thereby improve the use efficiency of the target. According to that, the denuded zone of the target widens and the utilization ratio of the target is enhanced. CONSTITUTION: A sputtering magnetron comprises a backing tube to which a cylindrical target(701) is attached, a fixed magnet unit comprising first and second magnet groups arranged at an interval in the center of the backing tube, a rotary magnet unit(600) comprising third to fifth magnet groups arranged at intervals on both ends in the backing tube, and driving systems(711,712) which rotate the backing tube and the rotary magnet unit, respectively, and move plasma racetracks created at both ends of the cylindrical target according to the rotation of the fixed and rotary magnet units. |
