发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR SPACER AND SPACER MANUFACTURED BY THE SAME
摘要 <p>PURPOSE: A photosensitive resin composition for forming a spacer and a spacer manufactured by the same are provided to improve solvent resistance properties and heat resistance properties. CONSTITUTION: A photosensitive resin composition for forming a spacer includes an oxime ester-based photo-initiator which is represented by chemical formula 1. The composition further includes one or more photo-initiators selected from a group including a triazine-based compound, an acetophenone-based compound, a biimidazol-based compound, an oxime-based compound, a benzoin-based compound, a benzophenone-based compound, a thioxanthone-based compound, and an anthracene-based compound. The composition further includes an alkali soluble resin, a photo-curable monomer, and a solvent. The spacer is made of the composition.</p>
申请公布号 KR20130063715(A) 申请公布日期 2013.06.17
申请号 KR20110130231 申请日期 2011.12.07
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HWA SUP;IM, MIN JU;JUNG, BO RAM
分类号 G03F7/004 主分类号 G03F7/004
代理机构 代理人
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