| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective mask blank capable of reducing reflection of EUV light from a light-shielding frame sufficiently while preventing the charging of a transfer region surrounded by the light-shielding frame, suppressing deterioration of flatness or occurrence of phase defect in a reflective layer, and preventing generation of foreign matters by protecting the side face of the reflective layer in the light-shielding frame even for repeat cleaning, and to provide a reflective mask, and manufacturing methods therefor. <P>SOLUTION: Not only a transfer region surrounded by a light-shielding frame and the surface of a region on the outside of a region where the light-shielding frame is formed, but also the side face and the bottom face of the light-shielding frame are covered with an absorption layer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
