发明名称 |
SEMICONDUCTOR DEVICE STACKED PACKAGE AND METHOD OF FORMING THE SAME |
摘要 |
<p>PURPOSE: A semiconductor device stacked package and a method for forming the same are provided to remove a copper contaminant generated in a process for etching the upper surface of a substrate to expose a through via. CONSTITUTION: A substrate(10) includes a lower surface(10a) where a passivation layer(11) is formed and an upper surface(10b) facing the lower surface. A through via(12) passes through the upper and the lower surface of the substrate. A first pad(14) electrically connected to the through via is formed on the passivation layer. A second pad(18) is formed on the through via exposed to the upper surface of the substrate. The second pads are electrically connected to the through vias, the first pads, and a first solder ball(16).</p> |
申请公布号 |
KR20130063579(A) |
申请公布日期 |
2013.06.17 |
申请号 |
KR20110129986 |
申请日期 |
2011.12.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHUNG, HYUN SOO;KIM, JUM GON;PARK, BYUNG LYUL;CHOI, GIL HEYUN |
分类号 |
H01L23/48;H01L21/60;H01L23/12 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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