发明名称 AL ALLOY FILM, WIRING STRUCTURE HAVING AL ALLOY FILM, AND SPUTTERING TARGET USED IN PRODUCING AL ALLOY FILM
摘要 <p>The present invention provides an Al alloy film that, in a production step of a thin-film transistor substrate, reflective film, reflective anode, touch panel sensor, or the like, can effectively prevent corrosion such as pinhole corrosion (black dots) or corrosion of the Al alloy surface when immersed in a sodium chloride solution, has superior corrosion resistance, is able to suppress hillock formation, and has superior heat resistance. The Al alloy thin film is used as a reflective film or a wiring film on a substrate, and contains 0.01-0.5 at % of Ta and/or Ti and 0.05-2.0 at % of a rare earth element.</p>
申请公布号 KR20130063535(A) 申请公布日期 2013.06.14
申请号 KR20137008122 申请日期 2011.09.26
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO 发明人 OKUNO HIROYUKI;KUGIMIYA TOSHIHIRO
分类号 C23C14/14;C22C21/00;C23C14/34;G02F1/1368 主分类号 C23C14/14
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