POLISHING COMPOSITION AND METHOD FOR PRODUCING SAME

摘要

Provided is a technology pertaining to a polish with excellent sheen retention, durability, and ability to minimize occurrences of shoe marks and scratches, and in which loss of luster is unlikely to occur even if additional coats are applied. This polishing composition includes core shell structure particles (100) with an average particle size of 40 to 200 nm, and each having a core (150) and a shell (200) covering said core (150). The core (150) contains a copolymer (A) having a glass transition point of -70 to 0°C, and containing 0 to 20 mass% insoluble matter when dissolved in tetrahydrofuran. The shell (200) contains a copolymer (B) with a glass transition point of 20 to 70°C. The core shell structure particles (100) have a weight average molecular weight of 80,000 to 800,000, and contain 0 to 30 mass% insoluble matter when dissolved in tetrahydrofuran.