METHOD FOR MANUFACTURING MICRO-LENS AND PHOTO-MASK FOR MANUFACTURING MICRO-LENS

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a micro-lens for uniformly reducing a clearance between the adjacent micro-lenses of a convex micro-lens in a rectangular shape in plan view matrix-arrayed on a plane without causing an increase in a process load or deterioration of quality.

SOLUTION: A photo-mask to be used for patterning a photo-resist layer by a photo-lithography method is formed so as to be deformed such that roughly rectangular patterns are vertically and horizontally matrix-arrayed, and that the maximum distance of a clearance in a vertical direction between the patterns and the maximum distance of a clearance in a horizontal direction between the patterns and the distance of a clearance between the adjacent patterns in a diagonal direction become the same.

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