| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus which efficiently conducts cleaning. <P>SOLUTION: This invention relates to a substrate cleaning apparatus 60 including a transport part TRP transporting a substrate S in a predetermined direction and an ultrasonic oscillation part 63 which provides ultrasonic waves to a rear surface S2 of the substrate S transported in the predetermined direction by the transport part TRP thereby cleaning the surface side of the substrate S. The ultrasonic oscillation part 63 includes: a liquid supply part 62 which places a liquid SW in contact with the rear surface S2 of the substrate S utilizing surface tension; and a vibrator providing ultrasonic vibrations to the liquid SW. <P>COPYRIGHT: (C)2013,JPO&INPIT |
