发明名称 |
DEVICE AND METHOD FOR MASKLESS AFM MICROLITHOGRAPHY |
摘要 |
<p>The invention relates to a device and a method for maskless microlithography. Several microstructured cantilevers ( 2 ) are arranged in an array ( 26 ) and an actuator is integrated in each of the cantilevers ( 2 ) of the array ( 26 ). A power supply and control unit ( 24 ) is provided, said unit adjusting the distance of the cantilevers ( 6 ) relative to a surface ( 4 ) that is to be structured by means of an appropriate voltage. Every point of the needles ( 6 ) is connected to said power supply and control unit ( 24 ). In order to implement the inventive method, an array ( 26 ) with cantilevers, each of which carries a point of a needle ( 6 ), is brought into contact with a surface ( 4 ) to be structured in such a way that the points of the needles ( 6 ) are arranged close to the surface ( 4 ) to be structured.</p> |
申请公布号 |
EP1488193(B1) |
申请公布日期 |
2013.06.12 |
申请号 |
EP20030712019 |
申请日期 |
2003.03.14 |
申请人 |
VISTEC ELECTRON BEAM GMBH;RANGELOW, IVO |
发明人 |
RANGELOW, IVO;IVANOV, TZWETAN;HUDEK, PETER;FORTAGNE, OLAF |
分类号 |
G01Q80/00;B82Y10/00;B82Y35/00;B82Y40/00;G01Q70/06;G11B9/00;H01J37/317 |
主分类号 |
G01Q80/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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