| 摘要 |
PURPOSE: A single wafer type substrate processing apparatus is provided to collect various kinds of gases without controlling the height of a wafer, and to reduce the size of an apparatus. CONSTITUTION: A support part(10) rotates and supports a wafer. An inner chamber(20) includes first to third outlet(21-23). An external chamber includes first to third exhaust ports(31-33) which selectively expose a specific outlet. The first to third exhaust ports are arranged in the upper and the lower part of the lateral surface of the external chamber. The external chamber includes first to third collection tubes(34,35,36) for gathering process gases.
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