发明名称 INDUCTIVE COUPLING PLASMA SOURCE AS ELECTRON BEAM SOURCE FOR SPECTRAL ANALYSIS
摘要 <P>PROBLEM TO BE SOLVED: To provide a single-column inductive coupling plasma source that operates in an ion mode for FIB operation or electron mode for SEM operation, and configured to allow a user to make a selection. <P>SOLUTION: Energy dispersion type X-ray spectral analysis can be performed when an X-ray detector is mounted. The user selectively configures ICP so as to prepare a sample in the ion mode or FIB mode and actually moves a switch for selecting the electron mode or SEM mode, and can analyze the sample by using analysis of EDS or other types. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013115047(A) 申请公布日期 2013.06.10
申请号 JP20120256983 申请日期 2012.11.24
申请人 FEI CO 发明人 BRIAN ROBERTS ROUTH JR
分类号 H01J37/252;H01J27/16;H01J37/077;H01J37/08;H01J37/244;H01J37/317 主分类号 H01J37/252
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