| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition achieving a favorable cross-sectional shape with high rectangularity, a high film residual rate and reduction of bridge defects, and to provide a resist film and a pattern forming method using the composition, and a method for manufacturing an electronic device and an electronic device. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin having a repeating unit expressed by following general formula (1), a repeating unit having a lactone structure or a sultone structure, and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group; and (B) a compound that generates an acid by irradiation with actinic rays or radiation. In general formula (1), L represents a single bond or a divalent connecting group; R<SB POS="POST">1</SB>represents a hydrogen atom or an alkyl group; and Z represents a cyclic acid anhydride group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
