| 发明名称 |
ELASTIC MEMBRANE AND SUBSTRATE HOLDING DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To effectively inhibit excessive polishing of a substrate end and accurately control a polishing rate at the substrate end. <P>SOLUTION: An elastic membrane 4 used for a substrate holding device has an abutting part 400 to be abutted against the substrate to press the substrate toward a polishing pad. A lower surface of the abutting part 400 has a flat region A and a rise region B located on an outer peripheral part of the flat region and rising upward. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013111679(A) |
申请公布日期 |
2013.06.10 |
| 申请号 |
JP20110258833 |
申请日期 |
2011.11.28 |
| 申请人 |
EBARA CORP |
发明人 |
FUKUSHIMA MAKOTO;WATANABE KAZUHIDE;YASUDA HOZUMI;NAMIKI KEISUKE;NABEYA OSAMU;TOGASHI SHINGO;YAMAKI AKIRA |
| 分类号 |
B24B37/30;B24B37/005;H01L21/304 |
主分类号 |
B24B37/30 |
| 代理机构 |
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