APPARATUS FOR TREATING SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus is provided to prevent the contamination of a brush due to particles removed from a substrate. CONSTITUTION: A housing(320) provides a space for cleaning a substrate(W). A spin head(340) is formed in the housing to support and rotate the substrate. A spraying unit(380) supplies a cleaning solution onto the substrate. The spraying unit includes a support shaft(386), a driver(388), and an injection nozzle(384). A brush unit(360) is contacted with the substrate and decreases the adhesion of particles with the substrate.