PRECURSOR COMPOSITION FOR POROUS MEMBRANE AND PROCESS FOR PREPARATION THEREOF, POROUS MEMBRANE AND PROCESS FOR PRODUCTION THEREOF, AND SEMICONDUCTOR DEVICE

摘要

A precursor composition for porous film comprising at least one member selected from the group consisting of compounds represented by the following general formulas: Si(OR 1 ) 4 and R a (Si)(OR 2 ) 4-a (in the formulas, R 1 represents a monovalent organic group; R represents a hydrogen atom, a fluorine atom or a monovalent organic group; R 2 represents a monovalent organic group; a is an integer ranging from 1 to 3, provided that R, R 1 and R 2 may be the same or different); a heat decomposable organic compound capable of being thermally decomposed at a temperature of not less than 250°C; and at least one element selected from the group consisting of elements each having a catalytic action, and organic solvent. A hydrophobic compound is subjected to a gas-phase polymerization reaction in the presence of a solution of this precursor composition to thus form a hydrophobic porous film having a low dielectric constant, a low refractive index and high mechanical strength. A semiconductor device prepared using the porous film.