发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER READABLE STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which accurately determines the appropriateness of the holding state of a substrate without being influenced by the material and surface state of the substrate. <P>SOLUTION: The invention has: substrate holding means (22) for holding a substrate (2); image capturing means (25) for capturing an image in a region where an end edge part of the substrate (2) exists when the substrate (2) is held by the substrate holding means (22) in a normal way; and control means (26) for determining the holding state of the substrate (2) held by the substrate holding means (22) on the basis of the image captured by the image capturing means (25). <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013110270(A) 申请公布日期 2013.06.06
申请号 JP20110254087 申请日期 2011.11.21
申请人 TOKYO ELECTRON LTD 发明人 MATSUMOTO SOHEI;IWANAGA SHUJI;TOMITA HIROSHI;NAKAMIZO KENJI;MORITA SATOSHI
分类号 H01L21/304;G02F1/13 主分类号 H01L21/304
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