发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD FOR PERFORMING HEAT TREATMENT ON SUBSTRATE |
摘要 |
Each of substrates which are sequentially loaded into an apparatus is transferred to one of empty (available) cooling units, and the cooling unit is reserved as a unit to be used for performing a cooling treatment after a post-exposure bake process for the substrate and the reservation information is stored. After one of the cooling units is reserved in advance before the post-exposure bake process, the substrate is transferred from the cooling unit to one of heating units without being subjected to a cooling treatment and is subjected to a post-exposure bake process therein. After the post-exposure bake process, the substrate is transferred from the heating unit to the reserved cooling unit which is reserved in advance and subjected to a cooling treatment therein. |
申请公布号 |
US2013140000(A1) |
申请公布日期 |
2013.06.06 |
申请号 |
US201213667281 |
申请日期 |
2012.11.02 |
申请人 |
HASHIMOTO KATSUMI;NAKANISHI MANABU;MATSUSHITA TAKASHI |
发明人 |
HASHIMOTO KATSUMI;NAKANISHI MANABU;MATSUSHITA TAKASHI |
分类号 |
F25B29/00;F27D9/00 |
主分类号 |
F25B29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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