发明名称 PHOTOPOLYMERIZABLE COMPOSITION AND PATTERN FORMING METHOD USING SAME
摘要 <p>This photopolymerizable composition contains a photopolymerization initiator and (A) a siloxane compound represented by general formula (1) or (B) a siloxane compound represented by general formula (2). This photopolymerizable composition has a low viscosity and a low vapor pressure at room temperature, and can be coated by an inkjet method even in a state where no organic solvent is contained. When this photopolymerizable composition is photopolymerized, a siloxane resin, which is the polymerization product thereof, can be obtained with good reproducibility. Consequently, this photopolymerizable composition is suitable for use in a pattern forming method by means of optical nanoimprint. (In formula (1), group A represents a polymerizable group; m represents an integer of 1-10; n represents an integer of 1-10; and p represents an integer of 0-5.) (In formula (2), group B represents a polymerizable group; q represents an integer of 1-10; and r represents an integer of 0-5.)</p>
申请公布号 WO2013080741(A1) 申请公布日期 2013.06.06
申请号 WO2012JP78457 申请日期 2012.11.02
申请人 CENTRAL GLASS COMPANY, LIMITED 发明人 OGAWA, TSUYOSHI
分类号 H01L21/027;C08F2/48;C08F30/08;C08F230/08;C08F290/06;C08G59/30 主分类号 H01L21/027
代理机构 代理人
主权项
地址