| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved method for processing a substrate by an ion beam, and to provide an ion beam device for processing a substrate. <P>SOLUTION: A substrate (2) is processed by an ion beam (I) generated from the ion beam source (1.1) of an ion beam device (1) and directed toward the surface (2.1) of the substrate (2) in order to process the substrate (2). The ion beam (I) is guided by an orifice plate (1.3) formed of a carbon-containing material at least partially. Educts (E) reacting on carbon are guided between the orifice plate (1.3) and the substrate (2) in a flow having directivity, so that the carbon emitted from the orifice plate (1.3) by means of the ion beam (I) is oxidized. <P>COPYRIGHT: (C)2013,JPO&INPIT |
