发明名称 APPARATUS AND METHOD FOR TREATING PCB-CONTAMINATED FILM ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for treating a PCB-contaminated film element that can prevent the deterioration of a work environment in a storage facility in the case of storing the PCB-contaminated film after washing it. <P>SOLUTION: The apparatus for treating the PCB-contaminated film element includes a PCB removing washing apparatus 13 washing the subdivided (such as crushed or cut) PCB-contaminated film element 11 with a PCB removing solvent (IPA, NS100, haxane, or the like) 12; a completion determining apparatus 15 determining a residual PCB concentration in the PCB-removed film element 14 after washed by the PCB removing washing apparatus 13; and a solvent removing apparatus 16 putting dry ice in a mesh bag packed with the PCB-removed film element 14A that has passed the determination, and volatilizing and removing the remaining PCB removing solvent 12 while generating carbon dioxide by the sublimation of the dry ice to obtain the film element 14B from which the solvent and PCB are removed. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013107030(A) 申请公布日期 2013.06.06
申请号 JP20110253260 申请日期 2011.11.18
申请人 MITSUBISHI HEAVY IND LTD 发明人 TSUKAHARA CHISATO;TANAKA RYUICHIRO;OURA KOJI
分类号 B08B3/04;C08J11/08 主分类号 B08B3/04
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