发明名称 |
COMPOSITION FOR FORMING FERROELECTRIC THIN FILM, METHOD FOR FORMING FERROELECTRIC THIN FILM, FERROELECTRIC THIN FILM, AND COMPOSITE ELETRONIC PART |
摘要 |
<p>PURPOSE: A composition for forming a ferroelectric thin film is provided to comprise a stabilizer and a specific molecular mass of polyvinylpyrrolidone in an optimum ratio, thereby preventing incidence of crack on a thick ferroelectric thin film even when containing lead acetate. CONSTITUTION: A composition for forming a ferroelectric thin film forms a ferroelectric thin film comprising a lead titanate-perovoskite film or a lead titanate zirconate-complex perovkite film. The composition comprises: a stabilizer comprising lead acetate, acetylacetone, or diethanolamine, and polyvinylpyrrolidone. To the mole number of perovskite B site atom contained in the composition, the mole ratio of monomer-converted polyvinylpyrrolidone is in excess of 0 and less than 0.015, the weight-average molecular weight of the polyvinylpyrrolidone is not less than 5000 and not exceeding 100000. The composition also comprises raw materials containing a metal element comprising a lead titanate-perovoskite film or a lead titanate zirconate-complex perovskite film.</p> |
申请公布号 |
KR20130059286(A) |
申请公布日期 |
2013.06.05 |
申请号 |
KR20120133848 |
申请日期 |
2012.11.23 |
申请人 |
MITSUBISHI MATERIALS CORP. |
发明人 |
FUJII JUN;SAKURAI HIDEAKI;SOYAMA NOBUYUKI |
分类号 |
C01G25/00;C04B35/46;H01G4/12;H01L27/04 |
主分类号 |
C01G25/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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