| 摘要 |
A resist composition, a novel compound used as an acid generator in the composition, a method for preparing the compound, and a formation method of resist pattern are provided to improve the safety of handling when the accumulation in the human body is considered. A resist composition comprises a base component whose solubility in an alkali developer is changed by the action of an acid; and an acid generator component which generates an acid by exposure and comprises an acid generator comprising a compound represented by the formula b1-1, wherein R1 is an aryl group or an alkyl group; R3 is H or an alkyl group; n1 is 0 or 1; A is a divalent group forming a 3-7-membered ring together with the combined sulfur atom; R2 is an aromatic group, a C1-C10 linear or branched alkyl group, or a C2-C10 linear or branched alkenyl group; n is 0 or 1; and Y1 is a C1-C4 alkylene group substituted or unsubstituted with F. |
