| 摘要 |
PURPOSE: A substrate processing apparatus is provided to improve a selection ratio by independently controlling the pulse frequency of a lower power source, an upper power source, a duty ratio, and a phase. CONSTITUTION: An upper electrode(410) excites a reaction gas. An upper power source is electrically connected to the upper electrode. A lower electrode(220) is installed in a chuck(200). A lower power source(222,223,224) is electrically connected to the lower electrode. A control unit(600) controls the upper power, the frequency of a lower power, a duty ratio, and a phase.
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