发明名称 |
System and method to increase surface tension and contact angle in immersion lithography |
摘要 |
A system and method to allow organic fluids to be used in immersion lithographic systems. This is done by providing a showerhead portion of a liquid supply system that is partially coated or made from a TEFLON like material. The TEFLON like material reduces wetness effect, and thus increases containment, when using an organic immersion fluid in a space between the last optic and the substrate.
|
申请公布号 |
US8456611(B2) |
申请公布日期 |
2013.06.04 |
申请号 |
US20100834691 |
申请日期 |
2010.07.12 |
申请人 |
SEWELL HARRY;ASML HOLDING N.V. |
发明人 |
SEWELL HARRY |
分类号 |
G03B27/42;G03B27/52;G03B27/58 |
主分类号 |
G03B27/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|