发明名称 Method of fabricating wiring board and method of fabricating semiconductor device
摘要 A method of fabricating a wiring board includes forming a resist layer, such as a solder or plating resist layer, defining an opening portion on a support board such that a portion of the support board is exposed. An electrode is formed directly on the support board within the opening portion, and the plating resist layer, when used, is removed. An insulating layer is formed on the electrode, as well as the support board or solder resist layer, and a wiring portion connected to the electrode at the insulating layer is also formed. A solder resist layer having an opening portion is then formed on the wiring portion, and the support board is removed to expose a surface of the electrode or a surface of the electrode and insulating layer. Another solder resist layer having an opening portion may then be formed on the exposed surface of the insulating layer.
申请公布号 US8455770(B2) 申请公布日期 2013.06.04
申请号 US201113196129 申请日期 2011.08.02
申请人 NAKAMURA JUNICHI;KOBAYASHI YUJI;SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 NAKAMURA JUNICHI;KOBAYASHI YUJI
分类号 H05K1/11 主分类号 H05K1/11
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