发明名称 |
METHOD FOR REPRINTING PATTERN USING TRANSFER DEVICE AND METHOD FOR IRRADIATING ION BEAM |
摘要 |
PURPOSE: A method for reprinting a pattern using a transfer device and a method for irradiating an ion beam are provided to minimize a joint by reprinting the pattern on a cylindrical mold while moving a two-dimensional pattern mask. CONSTITUTION: A two-dimensional pattern mask(240) is located on a transfer device(200). A cylindrical mold(100) for reprinting a pattern of a two-dimensional pattern mask is located in the lower center of the transfer device. A shadow mask(260) with a gap(265) is located on the upper side of the two-dimensional pattern mask. The pattern is reprinted on a part of the outer side of the cylindrical mold by exposing a part of the two-dimensional pattern mask using an optical source(280). The two-dimensional pattern mask is moved by equally performing the linear movement of the transfer device and the rotational movement of the cylindrical mold.
|
申请公布号 |
KR20130057236(A) |
申请公布日期 |
2013.05.31 |
申请号 |
KR20110123054 |
申请日期 |
2011.11.23 |
申请人 |
NEW OPTICS, LTD. |
发明人 |
CHAE, JOO HYUN;JO, MYEONG GU;LEE, KYU MAN |
分类号 |
H01L21/027;H01L21/266 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|