| 摘要 |
<p>FERROMAGNETIC SPUTTERING TARGETProvided is a ferromagnetic sputtering target having a metal composition5 comprising 20 mol% or less of Cr, 5 mol% or more of Pt, and the balance of Co, wherein the target includes a metal base (A) and two different phases (B) and (C) in the metal base (A), the phase (B) being a Co-Ru alloy phase containing 30 nnol% or more of Ru, and the phase (C) being a metal or alloy phase primarily composed of Co or a Co alloy. The present invention improves the leakage10 magnetic flux to provide a ferromagnetic sputtering target that can perform stable discharge with a magnetron sputtering device.</p> |
