| 摘要 |
<p>Fe-Pt-BASED SPUTTERING TARGET WITH DISPERSED C GRAINSA sintered compact sputtering target in which a composition ratio based on 5 atomicity is represented by a formula of (Feloo-x-Ptx)loo-A-CA (provided A is anumber which satisfies 20 SA 50 and Xis a number which satisfies 35S 55), wherein C grains are finely dispersed in an alloy, and the relative density is 90% or higher.An object of this invention is to enable the production of a magnetic thin film10 with granular structure without using an expensive simultaneous sputtering device, as well as provide a high-density sputtering target capable of reducing the amount of particles generated during sputtering.[Selected Drawing] Fig. 115</p> |
