发明名称 POSITION DETECTION DEVICE AND EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a position detection device that performs highly accurate position detection by reducing a measurement error ascribable to a wavelength difference. <P>SOLUTION: A position detection device, which detects a position of a detection target object WM using a reference mark SM, includes: a first illumination optical system 5 that illuminates the detection target object WM with measurement light having a first wavelength band; a second illumination optical system 13 that illuminates the reference mark SM with reference light having a second wavelength band; a detection optical system 10 that detects a light flux from the detection target object WM and a light flux from the reference mark SM; and a position detection part 48 for detecting a position of the detection target object WM on the basis of the light fluxes detected by the detection optical system 10, wherein the second wavelength band of the reference light is set between an upper limit and a lower limit of the first wavelength band of the measurement light. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013105936(A) 申请公布日期 2013.05.30
申请号 JP20110249560 申请日期 2011.11.15
申请人 CANON INC 发明人 SAKAMOTO NORITOSHI
分类号 H01L21/027;G01B11/00;G03F9/00 主分类号 H01L21/027
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