发明名称 CMOS Image Sensor Big Via Bonding Pad Application for AICu Process
摘要 An integrated circuit includes a substrate having a bonding pad region and a non-bonding pad region. A relatively large via, called a "big via," is formed on the substrate in the bonding region. The big via has a first dimension in a top view toward the substrate. The integrated circuit also includes a plurality of vias formed on the substrate in the non-bonding region. The plurality of vias each have a second dimension in the top view, the second dimension being substantially less than the first dimension.
申请公布号 US2013134543(A1) 申请公布日期 2013.05.30
申请号 US201213728710 申请日期 2012.12.27
申请人 LTD. TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY,;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 TSENG UWAY;WU LIN-JUNE;LIN YU-TING
分类号 H01L27/146 主分类号 H01L27/146
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