APPARATUS AND METHOD FOR TREATING SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to improve a substrate processing rate by vertically laminating a plurality of processing chambers to arrange more processing chambers on the same footprint. CONSTITUTION: A supporting member(3300) supports a substrate between a top housing and a bottom housing. A lifting member(3200) lifts the top housing or the bottom housing. A heating member(3400) heats supercritical fluid supplied to a second processing chamber(3000) over a critical temperature. A supply port(3500a,3500b) supplies the supercritical fluid to the second processing chamber. An exhaust port(3600) exhausts the second processing chamber of the supercritical fluid.