| 摘要 |
PURPOSE: A valve device for a thin film deposition apparatus is provided to be installed to reduce standing wave effect which is generated when plasma, which is generated in a process chamber of a large-sized PECD, flows into a transfer chamber. CONSTITUTION: A valve device for a thin film deposition apparatus includes a process chamber, a transfer chamber, a valve housing, and a gate valve module. The process chamber receives a supplied glass substrate, and performs a disposition treatment on the glass substrate. The transfer chamber supplies or returns the glass substrate to the process chamber. The valve housing is connected with the process chamber and the transfer chamber. The gate valve module shuttles inside the valve housing to respectively operate the process chamber and the transfer chamber.
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