发明名称 |
METHOD FOR PRE-EPITAXIAL TREATMENT OF SURFACE OF GERMANIUM SUBSTRATE |
摘要 |
FIELD: chemistry.SUBSTANCE: method for pre-epitaxial treatment of the surface of a germanium substrate involves removing the oxide layer from the surface of the substrate, cleaning the germanium surface from inorganic impurities and passivation of the substrate surface. The oxide is removed from the germanium surface by immersing the substrate into hydrochloric acid solution with concentration of 30-40 wt % for 2-4 minutes. Germanium is cleaned from inorganic impurities by immersing the substrate into a solution which contains hydrofluoric acid, hydrogen peroxide, tartaric acid and water for 0.5-1.5 minutes; passivation of the germanium surface is carried out in hydrochloric acid solution with concentration of 30-40 wt % for 2-5 minutes. The substrate surface is prepared at temperature of 19-23°C.EFFECT: method simplifies the process of pre-epitaxial treatment of the surface of a germanium substrate by cutting the number of treatment steps with minimal modification of the surface of the substrate. |
申请公布号 |
RU2483387(C1) |
申请公布日期 |
2013.05.27 |
申请号 |
RU20110151265 |
申请日期 |
2011.12.14 |
申请人 |
FEDERAL'NOE GOSUDARSTVENNOE BJUDZHETNOE UCHREZHDENIE NAUKI FIZIKO-TEKHNICHESKIJ INSTITUT IM. A.F. IOFFE ROSSIJSKOJ AKADEMII NAUK |
发明人 |
ANDREEV VJACHESLAV MIKHAJLOVICH;KUDRJASHOV DMITRIJ ALEKSANDROVICH;LEVIN ROMAN VIKTOROVICH |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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