发明名称 MEASURING METHOD AND MEASURING APPARATUS OF PUPIL TRANSMITTANCE DISTRIBUTION, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>A measuring apparatus for measuring a pupil transmittance distribution of an optical system to be examined has a diffraction grating mounted on a first surface in an optical Fourier transform relation with a pupil of the optical system, an illumination optical system which makes a beam inclined relative to the optical axis, incident to a predetermined position on the first surface so that a +first-order diffracted beam, generated through the diffraction grating, passes through a first pupil partial region in an effective region of the pupil and so that a−first-order diffracted beam, generated through the diffraction grating, passes through a second pupil partial region, and a measuring unit which measures an intensity of the +first-order diffracted beam, and an intensity of the−first-order diffracted beam, and the measuring apparatus determines a ratio of a pupil transmittance in the first and second pupil partial regions.</p>
申请公布号 KR20130054942(A) 申请公布日期 2013.05.27
申请号 KR20127024951 申请日期 2011.02.14
申请人 NIKON CORPORATION 发明人 KITA NAONORI
分类号 H01L21/027;G01M11/02;G03F7/20 主分类号 H01L21/027
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