发明名称 |
HIGH PRODUCTIVITY COMBINATORIAL WORKFLOW FOR PHOTORESIST STRIP APPLICATIONS |
摘要 |
Electrical testing of metal oxide semiconductor (MOS) high-k capacitor structures is used to evaluate photoresist strip or cleaning chemicals using a combinatorial workflow. The electrical testing can be able to identify the damages on the high-k dielectrics, permitting a selection of photoresist strip chemicals to optimize the process conditions in the fabrication of semiconductor devices. The high productivity combinatorial technique can provide a compatibility evaluation of photoresist strip chemicals with high-k devices.
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申请公布号 |
US2013130414(A1) |
申请公布日期 |
2013.05.23 |
申请号 |
US201113298524 |
申请日期 |
2011.11.17 |
申请人 |
LI BEI;BARSTOW SEAN;DUONG ANH;HONG ZHENDONG;LACEY ASHLEY;INTERMOLECULAR, INC. |
发明人 |
LI BEI;BARSTOW SEAN;DUONG ANH;HONG ZHENDONG;LACEY ASHLEY |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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