发明名称 Stage device, exposure apparatus, and method of manufacturing devices
摘要 A stage device, wherein a stage (RST) is allowed to move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate (16) and holding a reticle, and a frame-shaped member (18) is allowed to move in the three degrees of freedom directions in the two-dimensional plane while floating above the surface plate. First fixed elements (1361 to 1382) and second fixed elements (1401, 1402) are fitted to the frame-shaped member, and first movable elements and second movable elements generating drive forces to drive the stage in the two-dimensional plane in cooperation with the first and second fixed elements are fitted to the stage. Accordingly, a reaction force generated by the driving of the stage acts on the first or second fixed elements, and by this reaction force, the frame-shaped member is moved in the two-dimensional plane generally according to the law of conservation of momentum. Thus, because the reaction force caused by the movement of the stage is substantially completely cancelled, and because the movement of the center of gravity of a system including the stage and the frame-shaped member does not occur, no unbalanced load acts on the surface plate. <IMAGE>
申请公布号 EP2560192(A3) 申请公布日期 2013.05.22
申请号 EP20120191221 申请日期 2004.01.26
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, YUICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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