发明名称 Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
摘要 A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.
申请公布号 US8446578(B2) 申请公布日期 2013.05.21
申请号 US20090591298 申请日期 2009.11.16
申请人 SUGIHARA MARI;OOMORI TAKEO;FUKAZAWA KAZUHIKO;NIKON CORPORATION 发明人 SUGIHARA MARI;OOMORI TAKEO;FUKAZAWA KAZUHIKO
分类号 G01N21/94 主分类号 G01N21/94
代理机构 代理人
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