| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical interference system, a substrate processor, and a measurement method that are able to easily change the upper limit value of a measurable film thickness. <P>SOLUTION: An optical interference system 1 includes: a light source 10; collimator 12; a single light receiving element 41; a tunable filter 40; and an arithmetic unit 15. The collimator 12 emits measurement light from the light source 10 to a first main surface of a measurement target, and receives reflection light from the first main surface and a second main surface. The single light receiving element 41 acquires the intensity of light from the collimator 12. The tunable filter 40 sweeps the wavelength of light incident to the light receiving element 41. The arithmetic unit 15 measures an interference intensity distribution, which is an intensity distribution of the reflection light from the first and second main surfaces and depends on the wavelength, using the tunable filter 40 and the light receiving element 41. The arithmetic unit 15 also measures the thickness and the temperature of a measurement target on the basis of the wave pattern obtained through Fourier transformation of the light interference intensity distribution. <P>COPYRIGHT: (C)2013,JPO&INPIT |
