| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment mark enabling highly accurate alignment between a substrate and a mask, and an exposure device. <P>SOLUTION: When positioning a substrate and a mask relative to each other, a micro-lens array is arranged between a substrate alignment mark 32 and a mask alignment mark 31, and alignment light is applied to them to form an erect equal-magnification image of the substrate alignment mark 32 on the mask. In the mask alignment mark 31, all the sides 3e, 3f, 3g, 3h defining the contour of the mask alignment mark 31 are inclined with respect to the arrangement direction of the micro-lenses. <P>COPYRIGHT: (C)2013,JPO&INPIT |
