| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical mechanism for EUV lithography reducing deformation caused by an influence of a temperature, and to provide a method for constituting the optical mechanism having especially a projection lens and an optical element. <P>SOLUTION: This optical mechanism includes a second mirror 22 including a reflection surface 31a and a substrate 32 constituted of TiO<SB POS="POST">2</SB>-doped quartz glass having a temperature-dependent thermal expansion coefficient having zero crossing at a first zero-cross temperature T<SB POS="POST">ZC1</SB>, and a second optical element including a reflection surface and a second substrate constituted of TiO<SB POS="POST">2</SB>-doped quartz glass having a temperature-dependent thermal expansion coefficient having zero crossing at a second zero-cross temperature which is different from the first zero-cross temperature, wherein the gradient (ΔCTE<SB POS="POST">1</SB>>) of the thermal expansion coefficient of the first substrate 32 at the first zero-cross temperature and/or the gradient (ΔCTE<SB POS="POST">2</SB>) of the thermal expansion coefficient of the second substrate at the second zero-cross temperature have a negative sign, respectively. <P>COPYRIGHT: (C)2013,JPO&INPIT |
