发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE, DEVICE MANUFACTURING METHOD, AND ILLUMINATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an illumination optical system which can adjust pupil intensity distribution for each position on an irradiated surface to realize a desired illumination condition. <P>SOLUTION: An illumination optical system for illuminating an irradiated surface with light from a light source comprises: an optical integrator which is disposed in an optical path between the light source and the irradiated surface; and an adjustment unit, disposed in an optical path between the optical integrator and the irradiated surface, which adjusts at least one of pupil intensity distribution in the illumination pupil of the illumination optical system and illuminance distribution of on the irradiated surface. The adjustment unit includes a pair of optical surfaces disposed in close vicinity to the optical axis direction of the illumination optical system, so that incident light is multiple- interfered between the pair of optical surfaces before being emitted to the outside. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013098208(A) 申请公布日期 2013.05.20
申请号 JP20110236907 申请日期 2011.10.28
申请人 NIKON CORP 发明人 KOYAMA MOTOO
分类号 H01L21/027;G02B5/28;G03F7/20 主分类号 H01L21/027
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