| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic resist composition capable of reducing generation of defects such as coating defects and pattern defects. <P>SOLUTION: A production method of a lithographic resist composition is provided, including at least a step of filtering a lithographic resist composition through a filter. In the filtering step, after a chamber where the filter is disposed is held at a reduced pressure, the lithographic resist composition is made to pass through the filter. <P>COPYRIGHT: (C)2013,JPO&INPIT |
