| 发明名称 |
RESIST COMPOSITION AND METHOD OF MANUFACTURING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can manufacture a resist pattern excellent in line edge roughness. <P>SOLUTION: A resist composition contains: a resin that has a structural unit having a phenolic hydroxy group, is insoluble or poorly soluble in an aqueous alkali solution and becomes soluble in the aqueous alkali solution by the action of acid; an acid generator having an acid-decomposable group; and a dipolar ion compound. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013092755(A) |
申请公布日期 |
2013.05.16 |
| 申请号 |
JP20120210440 |
申请日期 |
2012.09.25 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
SUGIHARA MASAKO;ANDO NOBUO;YAMASHITA HIROKO |
| 分类号 |
G03F7/039;C07D307/33;C09K3/00;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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