PHOTORESIST STRIPPER COMPOSITION

摘要

PURPOSE: A photoresist exfoliating solution composition is provided to have an excellent performance of removing residue strip of resist by dry/wet etching in pattern formation, and to have an effect of not leaving anti-corrosive agent on the substrate surface by using an anti-corrosive agent having an excellent solubility to water and a solvent represented by chemical formula 2 in a manufacturing process of a flat panel display substrate. CONSTITUTION: A resist exfoliating solution composition includes 0.01-5 weight% of an anti-corrosive agent of chemical formula 1, 1-40 weight% of an alkali compound, and 55-90 weight% of solvents including a solvent of chemical formula 2 and other organic solvents. A resist exfoliating solution composition further includes deionized water. A resist exfoliating solution composition further includes at least one kind selected from the group consisting of azol compounds, quinone compounds and alkyl gallate compounds as the anti-corrosive agent. A flat panel display device is characterized in including a flat panel display substrate which is manufactured by using the resist exfoliating solution composition.