发明名称 |
INTEGRATED CIRCUIT HAVING A MOM CAPACITOR AND METHOD OF MAKING SAME |
摘要 |
PURPOSE: An integrated circuit including a MOM(Metal Oxide Metal) capacitor and a manufacturing method thereof are provided to reduce the size of the integrated circuit by using a thin fin structure. CONSTITUTION: A capacitor dielectric layer is arranged on the main surface of a substrate. A first semiconductor fin(4) is extended to the main surface in a first recess. A first capacitor electrode(2) is arranged on the upper side of the first semiconductor fin. A second semiconductor fin(8) is arranged in a second recess. A second capacitor electrode(6) is arranged on the upper side of the second semiconductor fin. |
申请公布号 |
KR20130049690(A) |
申请公布日期 |
2013.05.14 |
申请号 |
KR20120000660 |
申请日期 |
2012.01.03 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIU CHI WEN;WANG CHAO HSIUNG |
分类号 |
H01L27/108;H01L21/8242 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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