| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a quality monitoring system capable of recognizing occurrence of a failure in an early stage by using defect information of a previous process to select a defect detected in the latest process, improving monitoring accuracy of the defect occurring in the latest process and improving a detection speed of a quality abnormality in a process for forming each layer of an antireflection film manufacturing process. <P>SOLUTION: The quality monitoring system includes an inspection machine provided in each process in a manufacturing process, an inspection information management database for storing and managing inspection information obtained from the inspection machine, a production information management database for managing quality information and result information in each process of a product roll, defect selection means for selecting a defect that occurs in the latest process by correcting the coordinates of a defect selection position in the latest process and the previous process on the basis of the inspection information management database and the production information management database, and defect monitoring means for determining that the defect selected by the defect selection means is an abnormality on the basis of an abnormality determination condition and notifying the abnormality. <P>COPYRIGHT: (C)2013,JPO&INPIT |
