| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus capable of enhancing the displacement efficiency of atmosphere after chemical treatment. <P>SOLUTION: A liquid processing apparatus 10 comprises: a substrate holding section 21 for holding a substrate W horizontally; and a top plate 32 which covers the substrate W held in the substrate holding section 21 from above and forming a processing space 30 which covers the substrate W held in the substrate holding section 21. In the processing space 30, chemical is supplied by a chemical nozzle 82a to the substrate W held in the substrate holding section 21, and replacement gas for replacing the atmosphere of the processing space 30 is supplied by a replacement nozzle 82c to the processing space 30. The chemical nozzle 82a is supported by a replacement nozzle support arm 82r moving in the horizontal direction between an advance position in the processing space 30 and a retreat position on the outside of the processing space 30, and discharges the replacement gas upward. <P>COPYRIGHT: (C)2013,JPO&INPIT |
