发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>Provided is a semiconductor device with which, while alleviating thermal resistance increases, it is possible to minimize thermal resistance which is applied to a solder layer. The semiconductor device has a positioning structure which comprises a semiconductor element (5), a solder layer (4) which is positioned on at least one face of the semiconductor layer, and a lead frame (2) which is positioned sandwiching a porous nickel plating part (1) against the semiconductor layer. The thermal resistance increase of the solder bonding part is restricted only to the increase from the porous nickel plating part and the thermal resistance which is applied to the solder layer may be reduced beyond that which results when directly bonding the semiconductor element to the lead frame.</p>
申请公布号 WO2013065230(A1) 申请公布日期 2013.05.10
申请号 WO2012JP06277 申请日期 2012.10.01
申请人 PANASONIC CORPORATION 发明人 IKUTA, KEIKO;JIN, LIANJI;HIROSE, TAKAYUKI;KOJIMA, TOSHIYUKI;TSUKAHARA, NORIHITO;TANDA, KOHICHI
分类号 H01L23/36;C25D7/00;H01L23/48 主分类号 H01L23/36
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