WAFER LOADING SYSTEM OF VERTICAL DIFFUSION FURNACE FOR MANUFACTURING SEMICONDUCTOR AND WAFER LOADING METHOD USING THE SAME

摘要

PURPOSE: A wafer loading system of a vertical diffusion furnace for manufacturing semiconductor and a wafer loading method using the same are provided to load wafers in a pair of tubes, and then perform a deposition process at the same time, and therefore to improve the productivity of wafers. CONSTITUTION: A pair of vertical furnaces(310,330) is arranged in a row. Tubes(320,340) are prepared in the vertical furnaces. A boat(300) loads wafers loaded in the tubes at regular intervals. A pair of cassettes(100) faces in a pair of the vertical furnaces. A transfer(200) is arranged between the pair of the vertical furnaces and the pair of the cassettes.